KMS Chongqing Institute of Green and Intelligent Technology, CAS
Preparation and photoelectric characterization of p-GeSe/p-WS2 heterojunction devices | |
Yan, Bing1,2; Zhang, Guoxin1,2; Ning, Bo1,3; Chen, Sikai1,3; Zhao, Yang1,3; Zhou, Dahua1; Shi, Xuan1; Shen, Jun1; Xiao, Zeyun1; Zhao, Hongquan1 | |
2022-08-11 | |
摘要 | The construction of van der Waals (vdW) heterojunctions has attracted widespread attention for various strategies in the optoelectronic field due to their band structural advantages. Herein, novel p-p heterojunctions based on p-GeSe and p-WS2 flakes are fabricated on 300 nm-SiO2/Si substrates by means of mechanical exfoliation and micro-area fixed-point transfer of the GeSe flakes onto the WS2 flakes. The thickness and quality of the materials are determined by atomic force microscope and Raman spectroscopy. Considerable photoelectric characteristics are exhibited by exploring the performance of the heterojunctions under a 635 nm laser illumination. The photoresponsivity (R-lambda), specific detectivity (D*), and external quantum efficiency (EQE) of the heterojunctions are measured to be 195.70 mA W-1, 2.879 x 10(7) Jones, and 38.28%, respectively. The results indicate the strong potential of the p-p type heterojunctions composed of GeSe and WS2 flakes in photoelectric devices, and our work provides parameters and technical support for the development of vdW heterojunction devices. |
关键词 | van der Waals heterojunction p-p type junction GeSe/WS2 optoelectronic properties |
DOI | 10.1088/1361-6463/ac6711 |
发表期刊 | JOURNAL OF PHYSICS D-APPLIED PHYSICS |
ISSN | 0022-3727 |
卷号 | 55期号:32页码:9 |
通讯作者 | Shi, Xuan(shixuan@cigit.ac.cn) ; Zhao, Hongquan(hqzhao@cigit.ac.cn) |
收录类别 | SCI |
WOS记录号 | WOS:000799595400001 |
语种 | 英语 |