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Fabrication of Vertical Organic Nanowire Arrays via Modified Nanoimprint Lithography
Zhang, Man1,2; Xia, Liangping1,3; Dang, Suihu1; Cao, Axiu2; Shi, Lifang2; Deng, Qiling2; Du, Chunlei1
2019-07-01
摘要In this study, polymer high-aspect-ratio vertical organic nanowire arrays with sub-100 nm resolution were fabricated using a new method based on modified nanoimprint lithography, including UV-imprinting process and chemical corrosion solution. Porous anodic alumina membranes are the imprint templates having pore diameters of about 300 nm and 70 nm-90 nm. We performed the fabrication of the polymer nanowire array structures. Replication performance for the UV-curable imprint resister was verified by nanoimprinting technique to replicate the porous anodic alumina templates. Releasing the templates using chemical corrosion of alkali solution, we achieved the polymer nanowire arrays with nanowire diameters of 300 nm and 70 nm-90 nm and depths of 30 mu m and 3 mu m, and the aspect ratio of about 100:1 and 40:1. We herein also discuss the physical performance of the polymer resist and optical performance for high-aspect-ratio structures. The polymer nanowire arrays have potential applications such as electronic and optical devices and new method in complicated and extreme structures.
关键词Vertical Organic Nanowire Arrays Modified Nanoimprint Lithography Porous Anodic Alumina High-Aspect-Ratio Chemical Corrosion Solution
DOI10.1166/nnl.2019.2972
发表期刊NANOSCIENCE AND NANOTECHNOLOGY LETTERS
ISSN1941-4900
卷号11期号:7页码:1004-1007
通讯作者Zhang, Man()
收录类别SCI
WOS记录号WOS:000483217400013
语种英语