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Enhancement of photoluminescence efficiency in GeSe ultrathin slab by thermal treatment and annealing: experiment and first-principles molecular dynamics simulations
Mao, Yuliang1; Mao, Xin1; Zhao, Hongquan2; Zhang, Nandi1; Shi, Xuan2; Yuan, Jianmei3
2018-12-05
摘要The effect of thermal treatment and annealing under different temperatures from 100 degrees C to 250 degrees C on the photoluminescence spectroscopy of the GeSe ultrathin slab is reported. After the thermal treatment and annealing under 200 degrees C, we found that the photoluminescence intensity of A exciton and B exciton in GeSe ultrathin slab is increased to twice as much as that in untreated case, while is increased by similar to 84% in the photoluminescence intensity of C exciton. Combined by our experimental work and theoretical simulations, our study confirms the significant role of thermal treatments and annealing in reducing surface roughness and removing the Se vacancy to form more compact and smoother regions in GeSe ultrathin slab. Our findings imply that the improved quality of GeSe surface after thermal treatments is an important factor for the photoluminescence enhancement.
DOI10.1038/s41598-018-36068-x
发表期刊SCIENTIFIC REPORTS
ISSN2045-2322
卷号8页码:9
通讯作者Mao, Yuliang(ylmao@xtu.edu.cn) ; Zhao, Hongquan(hqzhao@cigit.ac.cn)
收录类别SCI
WOS记录号WOS:000452205300022
语种英语