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The effect of radial polarization in multiphoton lithography
Lin, Le1,3; Zheng, Mei-Ling1; Dong, Xian-Zi1; Duan, Xuan-Ming1,2; Zhao, Zhen-Sheng1
2015
摘要Considering the axially symmetric polarization and intensity distribution, radially polarized (RP) laser beam has comparatively higher axial component of electric field and smaller size of focal spot compared to linearly polarized (LP) laser. In this study, the effect of radial polarization on multiphoton fabrication has been studied, and polymer spots and lines are chosen as the study objects of 2D micro/nano structures of multiphoton lithography. These structures were fabricated with IP-L, a commercial negative photoresist, by RP fs-pulse laser beam which was tightly focused by an objective lens with high numerical aperture. Multiple experimental conditions, such as fabrication power, exposure time and scanning velocity, were verified in order to observe the structural variation of these polymer structures. On the basis of measurement from images of the scanning electron microscope, the transverse and longitudinal sizes of polymer spots and lines could be analyzed, and the relationship between the aspect ratio (AR) and the above experimental conditions could be acquired. The statistical results agree with our predictions that the RP laser beam can significantly reduce the AR, and the AR in RP laser fabrication has little correlation with conditions besides fabrication power, such as exposure time and scanning velocity. © COPYRIGHT 2015 SPIE.
语种英语
DOI10.1117/12.2203153
会议(录)名称Applied Optics and Photonics, China: Advances in Laser Technology and Applications, AOPC 2015
通讯作者Dong, Xian-Zi (dongxianzi@mail.ipc.ac.cn)
收录类别EI
会议地点Beijing, China
会议日期May 5, 2015 - May 7, 2015