KMS Chongqing Institute of Green and Intelligent Technology, CAS
| Nanofabrication with sub-50nm features by imprinting-induced cracks | |
Xia, Liangping1; Zhang, Man2; Yang, Zheng1 ; Yin, Shaoyun1; Du, Chunlei1
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| 2014 | |
| 摘要 | Nanofabrication is the foundation of nanophotonics and has become a research hotspot in the last decades. The method annealing crack is proposed to transfer the nanocracks from ultraviolet (UV) resist to other photonic materials. The method is demonstrated by simulating the inner stress distribution with the thermal-structure analysis. In addition, the parameter influence to the maximum stress is discussed and the results indicate that the annealing temperature has a large effect. The method is simple, low cost, high efficiency and is a good candidate to fabricate nanophotonic structures with critical size less than 50nm. © 2014 SPIE. |
| 语种 | 英语 |
| DOI | 10.1117/12.2073501 |
| 会议(录)名称 | Optical Design and Testing VI
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| 通讯作者 | Xia, Liangping |
| 收录类别 | EI |
| 会议地点 | Beijing, China |
| 会议日期 | October 9, 2014 - October 10, 2014 |
