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Analysis of Ag nanoparticle resist in fabrication of transmission-enhanced subwavelength structures
Kong, Xiangdong; Fu, Yuegang; Xia, Liangping; Zhang, Weiguo; Zhang, Ziyin; Dong, Lianhe; Wang, Deqiang; Du, Chunlei
2016
摘要A theoretical model is proposed to analyze the fabrication of metal nanopartical resist by metal nanofilm annealing, which is used in the manufacture of the transmission-enhanced subwavelength structures at the interface of the optical glass. Based on the conservation of volume of the metal before annealing and after heat treatment, the theoretical relationships of the structure parameters between the metal nanofilm and the metal nanoparticles are obtained. The experimental results coincide well with the theory model, which offers a theoretical guidance to fabricate subwavelength antireflected structures with the advantage of low cost achieved through metal nanofilm annealing. By this means, the average transmission of the quartz device intensifies to 97.9% for the structures fabricated on the both sides compared with the 93% for the unstructured one. (C) 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)
DOI10.1117/1.JNP.10.046017
发表期刊JOURNAL OF NANOPHOTONICS
ISSN1934-2608
卷号10期号:4
通讯作者Fu, YG (reprint author), Changchun Univ Sci & Technol, Opt & Elect Engn, 7186 Weixing Rd, Changchun 130022, Jilin, Peoples R China. ; Xia, LP ; Zhang, WG (reprint author), Chinese Acad Sci, Chongqing Inst Green & Intelligent Technol, Key Lab Multiscale Mfg Technol, 266 Fangzheng Rd, Chongqing 400714, Peoples R China.
收录类别SCI
WOS记录号WOS:000398606100017
语种英语