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Analysis of random antireflective structures fabricated by silver dewetting to enhance transmission
Kong, Xiangdong1,2; Fu, Yuegang1,3; Zhang, Weiguo2; Dong, Lianhe1; Zhou, Jianhong1; Wang, Deqiang2
2017-07-01
摘要The random antireflective structures are modeled by the analysis of the random morphology distribution. According to the effective medium theory, the transmission of the antireflective structure is calculated by dividing the structure into multilayer, and the dependence on parameters of the subwavelength is analyzed in detail. In the single-variable condition, etching depth, half breadth of distribution, and median of distribution get a positive correlation with the transmittance where the etching depth plays a most important part in enhancing the transmittance, whereas the angle of structures gets a negative correlation. The experimental results coincide well with the calculation and analysis. The analysis offers a theory guidance to fabricate random subwavelength antireflected structures using metal dewetting. (C) 2017 Society of Photo-Optical Instrumentation Engineers (SPIE)
关键词transmission enhanced subwavelength structures effective medium theory dewetting
DOI10.1117/1.JNP.11.036019
发表期刊JOURNAL OF NANOPHOTONICS
ISSN1934-2608
卷号11期号:3页码:9
通讯作者Fu, YG (reprint author), Changchun Univ Sci & Technol Opt & Elect Engn, Changchun, Jilin, Peoples R China. ; Zhang, WG (reprint author), Chinese Acad Sci, Chongqing Inst Green & Intelligent Technol, Key Lab Multiscale Mfg Technol, Chongqing, Peoples R China.
收录类别SCI
WOS记录号WOS:000413581300032
语种英语