KMS Chongqing Institute of Green and Intelligent Technology, CAS
| Physiochemical Coupled Dynamic Nanosphere Lithography Enabling Multiple Metastructures from Single Mask | |
Chang, Lin1,2; Liu, Xiaohong3; Luo, Jie4,5; Lee, Chong-Yew6; Zhang, Jianfa4,5; Fan, Xing7; Zhang, Wei1,2 
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| 2024-01-15 | |
| 摘要 | Metastructures are widely used in photonic devices, energy conversion, and biomedical applications. However, to fabricate multiple patterns continuously in single etching protocol with highly tunable photonic properties is challenging. Here, a simple and robust dynamic nanosphere lithography is proposed by inserting a spacer between the nanosphere assembly and the wafer. The nanosphere diameter decrease and uneven penetration of the spacer during etching lead to a dynamic masking process. Coupled anisotropic physical ion sputtering and ricocheting with isotropic chemical radical etching achieve highly tunable structures with various 3D patterns continuously forming through a single etching process. Specifically, the nanosphere diameters define the periodicity, the etched spacer forms the upper parts, and the wafer forms the lower parts. Each part of the structure is highly tunable through changing nanosphere diameter, spacer thickness, and etch conditions. Using this protocol, numerous structures of varying sizes including nanomushrooms, nanocones, nanopencils, and nanoneedles with diverse shapes are realized as proof of concepts. The broadband antireflection ability of the nanostructures and their use in surface-enhanced Raman spectroscopy are also demonstrated for practical application. This method substantially simplifies the fabrication procedure of various metastructures, paving the way for its application in multiple disciplines especially in photonic devices. By inserting a spacer between the nanosphere assembly and the wafer, novel dynamic nanosphere lithography is realized. With the physicochemical coupled etching mechanism, multiple metastructures with high controllability over their geometries are successfully fabricated continuously by a single etching step under a single mask.image |
| 关键词 | antireflection metastructure nanosphere lithography photonic devices SERS |
| DOI | 10.1002/adma.202310469 |
| 发表期刊 | ADVANCED MATERIALS
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| ISSN | 0935-9648 |
| 页码 | 11 |
| 通讯作者 | Zhang, Wei(zhangwei@cigit.ac.cn) |
| 收录类别 | SCI |
| WOS记录号 | WOS:001142403400001 |
| 语种 | 英语 |
