KMS Chongqing Institute of Green and Intelligent Technology, CAS
| Mechanism of force mode dip-pen nanolithography | |
Yang, Haijun1,2,3 ; Xie, Hui4; Wu, Haixia1; Rong, Weibin4; Sun, Lining4; Guo, Shouwu1; Wang, Huabin5
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| 2014-05-07 | |
| 摘要 | In this work, the underlying mechanism of the force mode dip-pen nanolithography (FMDPN) is investigated in depth by analyzing force curves, tapping mode deflection signals, and "Z-scan" voltage variations during the FMDPN. The operation parameters including the relative "trigger threshold" and "surface delay" parameters are vital to control the loading force and dwell time for ink deposition during FMDPN. A model is also developed to simulate the interactions between the atomic force microscope tip and soft substrate during FMDPN, and verified by its good performance in fitting our experimental data. (C) 2014 AIP Publishing LLC. |
| DOI | 10.1063/1.4875665 |
| 发表期刊 | JOURNAL OF APPLIED PHYSICS
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| ISSN | 0021-8979 |
| 卷号 | 115期号:17页码:6 |
| 通讯作者 | Yang, HJ (reprint author), Shanghai Jiao Tong Univ, Key Lab Thin Film & Microfabricat, Minist Educ, Res Inst Micro Nano Sci & Technol, Shanghai 200240, Peoples R China. |
| 收录类别 | SCI |
| WOS记录号 | WOS:000335643700645 |
| 语种 | 英语 |
