KMS Chongqing Institute of Green and Intelligent Technology, CAS
Direct versatile PECVD growth of graphene nanowalls on multiple substrates | |
Song, Xuefen1,2; Liu, Jian2; Yu, Leyong2; Yang, Jun2; Fang, Liang1; Shi, Haofei2; Du, Chunlei2; Wei, Dapeng2 | |
2014-12-15 | |
摘要 | In this paper, we demonstrated a simple and versatile technique to directly produce high-quality graphene nanowalls (GNWs) on multiple substrates by radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) at 750 degrees C without any catalyst and post-transfer. Similar morphologies and structures obtained under the same preparation process on different substrates revealed that the growth of GNWs was not sensitive to substrate. It was proposed that the GNWs grew via Volmer-Weber mechanism. The stresses from colliding islands would change the growth direction vertically upward. Then the erect growth along the edges would rely less on substrates. Owing to super-large surfaces and outstanding photoelectric properties, GNWs could bring broad applications of nanodevices. (C) 2014 Elsevier B.V. All rights reserved. |
关键词 | Carbon Materials Chemical Vapor Deposition Raman Net-like Structures |
DOI | 10.1016/j.matlet.2014.08.125 |
发表期刊 | MATERIALS LETTERS |
ISSN | 0167-577X |
卷号 | 137页码:25-28 |
收录类别 | SCI |
WOS记录号 | WOS:000345469700007 |
语种 | 英语 |